High Density Plasma Sources 2025 pdf epub mobi 电子书

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发表于2025-04-03

High Density Plasma Sources 2025 pdf epub mobi 电子书

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出版者:William Andrew Pub

作者:Popov, Oleg A. 编

出品人:

页数:468

译者:

出版时间:1997-1

价格:$ 214.70

装帧:HRD

isbn号码:9780815513773

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High Density Plasma Sources 2025 pdf epub mobi 电子书图书描述

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

High Density Plasma Sources 2025 pdf epub mobi 电子书

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