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Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书

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发表于2024-11-28

Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书

Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书

Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书


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出版者:Materials Research Society
作者:Calif.) Chemical-Mechanical Polishing 200 (2000 San Francisco
出品人:
页数:161
译者:
出版时间:2001-05
价格:USD 48.00
装帧:Hardcover
isbn号码:9781558995215
丛书系列:

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Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书 图书描述

Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. Other emerging applications for this technology include flat-panel displays, magnetic data storage and microelectromechanical systems. The rapid emergence of copper as the conducting material for integrated circuits has further pushed CMP technology to the forefront of semiconductor manufacturing. However, a basic understanding of the CMP process, which is necessary to enable further advances, is inadequate. This volume provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured.

Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书
Chemical-Mechanical Polishing 2000-Fundamentals and Materials Issues 2024 pdf epub mobi 电子书
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