Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书
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发表于2025-01-25
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书
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出版者:William Andrew Pub
作者:Schmitz, John E. J.
出品人:
页数:254
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出版时间:1993-1
价格:$ 162.72
装帧:HRD
isbn号码:9780815512882
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书 图书描述
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications 2025 pdf epub mobi 电子书
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